| 摘要 |
<p>Provided is an acid forming agent compound which is useful as a photoresist composition. According to desirable one embodiment of the present invention, provided are cyclic sulfonium salt and a photoresist composition containing such a compound. According to another desirable embodiment of the present invention, provided is an acid forming agent compound which includes a covalently bonded acid-labile residual group, more specifically, one or more ester-containing acid labile groups.</p> |
