| 摘要 |
Provided is a method of controlling an ion implantation apparatus 100 which includes: a mass separator 3 for sorting out and outputting ions having a specific mass number and valence from an ion beam IB extracted from an ion source 2; an acceleration tube 4 for accelerating or decelerating the ion beam IB output from the mass separator 3; and an energy separator 5 for sorting out and outputting ions having a specific energy from the ion beam IB output from the acceleration tube 4. The method comprises, during an acceleration mode, controlling an acceleration voltage VA such that it is prevented from becoming 0 kV. |
