发明名称 Mechanical fixture of pellicle to lithographic photomask
摘要 A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the pellicle frame from the reticle, cleaning the reticle, and mechanically reattaching the pellicle frame to the reticle. Embodiments further include using a clamp to mechanically attach the pellicle frame to the reticle. Embodiments further include forming the pellicle frame with a flange having an opening in the center, and forming the clamp with two portions, one portion with a protrusion that fittingly engages the opening in the flange and with a second opening, and the second portion with a segment that extends behind the reticle and with a second protrusion that fittingly engages the second opening.
申请公布号 US8681310(B2) 申请公布日期 2014.03.25
申请号 US20100958678 申请日期 2010.12.02
申请人 HOTZEL ARTHUR;GLOBALFOUNDRIES INC. 发明人 HOTZEL ARTHUR
分类号 G03B27/32;G03B27/42;G03B27/52;G03B27/62 主分类号 G03B27/32
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