发明名称 Method for Sr—Ti—O-based film formation
摘要 A film is formed so that the atomic numbers ratio of Sr to Ti, i.e., Sr/Ti, in the film is not less than 1.2 and not more than 3. The film is then annealed in an atmosphere containing not less than 0.001% and not more than 80% of O2 at 500� C. or above. An SrO film forming step or a TiO film forming step are repeated a plurality of times so that a sequence, in which a plurality of SrO film forming steps or/and a plurality of TiO film forming steps are performed continuously, is included. When Sr is oxidized after the adsorption of Sr, O3 and H2O are used as an oxidizing agent.
申请公布号 US8679913(B2) 申请公布日期 2014.03.25
申请号 US20080676237 申请日期 2008.09.02
申请人 KAWANO YUMIKO;ARIMA SUSUMU;KAKIMOTO AKINOBU;HIROTA TOSHIYUKI;KIYOMURA TAKAKAZU;TOKYO ELECTRON LIMITED 发明人 KAWANO YUMIKO;ARIMA SUSUMU;KAKIMOTO AKINOBU;HIROTA TOSHIYUKI;KIYOMURA TAKAKAZU
分类号 H01L21/8242;H01L21/02;H01L21/31;H01L21/316;H01L21/469 主分类号 H01L21/8242
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