| 发明名称 |
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD |
| 摘要 |
A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate. |
| 申请公布号 |
KR20140036028(A) |
申请公布日期 |
2014.03.24 |
| 申请号 |
KR20147003816 |
申请日期 |
2012.07.20 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DE JAGER PIETER;BANINE VADIM;BLEEKER ARNO;VAN DER SCHOOT HARMEN;STEVENS LUCAS;VERMEULEN JOHANNES;WUISTER SANDER |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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