发明名称 PLATING APPARATUS
摘要 According to the present invention, provided is a plating apparatus which comprises: a first anode plate; a second anode plate formed under the first anode plate; a first anode bar which supplies electricity to the first anode plate; a second anode bar which supplies electricity to the second anode plate; and a shield member which is arranged on the rear of the first anode plate, and which prevents the second anode bar from generating an electric current on the first anode plate.
申请公布号 KR20140035728(A) 申请公布日期 2014.03.24
申请号 KR20120102349 申请日期 2012.09.14
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 BAEK, HA WOON
分类号 C25D17/10;C25D17/12 主分类号 C25D17/10
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