| 摘要 |
Described are embodiments of a process including patterning one or more reflectors on a surface of a substrate of a material, the surface oriented at a selected angle relative to a (100) crystallographic plane of the material, and etching one or more reflectors in the surface, each reflector including one or more reflective surfaces formed by (111) crystallographic planes of the material. Also described are process embodiments for forming a molded waveguide including preparing a waveguide mold, the waveguide mold comprising a master mold including one or more reflectors on a surface of a substrate of a master mold material, the surface oriented at a selected angle relative to a (100) crystallographic plane of the material, each reflector including one or more reflective surfaces formed by (111) crystallographic planes of the material, injecting a waveguide material into the waveguide mold, and releasing the molded waveguide from the waveguide mold. |
