发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 ′Project′ The reliability of a semiconductor device is improved. ′Solution′ In the semiconductor device according to an embodiment 1, a mark (MK1) is installed in response to a bonding area of a target wire (BLW) exposed from an opening (OP1) installed in a solder resist (SR). According to this, in an alignment process of the wire bonding area, a coordinate position of the wire bonding area can be adjusted based on the mark (MK1) formed in response to the wire bonding area, not based on an end part of the opening (OP1) formed in the solder resist (SR). In addition, in the semiconductor device, the wire bonding area can be adjusted by camera recognition because the mark (MK1) that becomes a characteristic pattern is formed. [Reference numerals] (BLW) Target wire; (MK1) Mark; (OP1) Opening; (SR) Solder resist
申请公布号 KR20140035265(A) 申请公布日期 2014.03.21
申请号 KR20130108901 申请日期 2013.09.11
申请人 RENESAS ELECTRONICS CORPORATION 发明人 HIRONAGA KENYA;YASUNAGA MASATOSHI;HIRAI TATSUYA;KURODA SOSHI
分类号 H01L21/60 主分类号 H01L21/60
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