| 摘要 |
<p>Provided are: a method for manufacturing a mask blank, capable of preventing occurrence of fine flaws on a resist film, and particularly, occurrence of flaws cause by fine bubble, in the resist coating process for forming a resist film; and a method for manufacturing a transfer mask. As the method for manufacturing a mask blank, comprising a resist coating process including a loading process for loading a resist solution, if a rotating speed of the substrate is referred as R(t), a loading starting time of the resist solution as tA, and a loading ending time of the resist solution as tB, in a time range of tA<=t<=tB, the rotating speed of R(t) of the substrate changes so as to satisfy the relations of: (1) R(tA)<R(tB); (2) R(t1)<=R(t2)(t1<t2) during the time from tA to arrive at R(tB); (3) 0<=R(tA)<700 rpm; and (4) at least o.1 second of time from tA to arrive at R(tB). [Reference numerals] (AA) Rotating speed of a substrate (rpm); (BB) R, loading a resist solution; (CC) Time (sec)</p> |
