发明名称 METHOD FOR FORMING PHOTOCATALYST FILM IN DYE-SENSITIZED SOLAR CELL
摘要 <p>A method for forming a photocatalyst film (4) in a dye-sensitized solar cell that is provided with a transparent electrode (1), a counter electrode, an electrolyte layer that is arranged between these electrodes, and a photocatalyst film (4) which is arranged on the transparent electrode (1) side between the electrodes and which is obtained by having a photosensitizing dye adsorbed on an oxide semiconductor film (41). In this method, a dye inhibition film (5) constituting the dye-sensitized solar cell is formed on a desired region of the oxide semiconductor film (41) that is arranged on the transparent electrode (1) side, and then a dye solution is brought into contact with the oxide semiconductor film (41). Consequently, adsorption of the photosensitizing dye on the region where the dye inhibition film (5) is formed is inhibited, while having the photosensitizing dye adsorbed on the regions other than the region where the dye inhibition film (5) is formed in the oxide semiconductor film (41).</p>
申请公布号 WO2014041999(A1) 申请公布日期 2014.03.20
申请号 WO2013JP72797 申请日期 2013.08.27
申请人 HITACHI ZOSEN CORPORATION 发明人 SUGIYO, TAKESHI
分类号 H01M14/00;H01L31/04 主分类号 H01M14/00
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