发明名称 NORMALLY-OFF GALLIUM NITRIDE TRANSISTOR WITH INSULATING GATE AND METHOD OF MAKING SAME
摘要 <p>A normally-off transistor includes a channel layer, an electron supply layer overlaying the channel layer, a source electrode and a drain electrode on the electron supply layer, an area in the electrode supply layer between the source electrode and the drain electrode treated with a fluoride based plasma followed by a chlorine based plasma treatment, a gate insulator overlaying the area, and a gate electrode overlaying the gate insulator.</p>
申请公布号 WO2013184850(A4) 申请公布日期 2014.03.20
申请号 WO2013US44383 申请日期 2013.06.05
申请人 HRL LABORATORIES, LLC 发明人 CHU, RONGMING;HUGHES, BRIAN;CORRION, ANDREA;BURNHAM, SHAWN D.;BOUTROS, KARIM S.
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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