发明名称 METHOD FOR PRODUCING SILICON SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a GFZ method.SOLUTION: The present invention relates to a method for producing a silicon single crystal that comprises the steps of: heating a silicon plate by induction heating; melting granular silicon on the silicon plate; supplying the molten silicon to a phase boundary where a crystallization of the single crystal takes place through a flow conduit tube at the center of the plate; heating a silicon ring arranged above the plate having lower resistance than the plate by induction heating prior to the step for heating the plate by induction heating; and melting the ring.
申请公布号 JP2014051430(A) 申请公布日期 2014.03.20
申请号 JP20130176704 申请日期 2013.08.28
申请人 SILTRONIC AG 发明人 LOBMEYER JOSEF;GEORG BRENNINGER;WALDEMAR STEIN
分类号 C30B29/06;C30B13/20 主分类号 C30B29/06
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