发明名称 APPARATUS FOR MONITORING PLASMA PARTICLES AND METHOD THEREOF
摘要 The present invention relates to an apparatus and a method for monitoring plasma particles. According to the present invention, the provided plasma particle monitoring apparatus includes: an image input unit which receives a photographed image which photographs plasma particles in a plasma chamber; and an analyzing unit which determines the normal state of the plasma particles by using the gray scale value of pixels which compose the photographed image. The apparatus and the method for monitoring plasma particles are able to determine the excessive state and normal state of the plasma particles by analyzing the gray scale value of pixels which compose a photographed image after obtaining the photographed image which photographs the plasma particles in a plasma chamber. [Reference numerals] (AA) Start; (BB) End; (S210) Receive a photographed image which photographs plasma particles; (S220) Adjust a gray scale value of pixels which form a photographed image by changing the brightness value or comparison value of the photographed image; (S230) Determine the normality of plasma particles by using the gray scale value of the pixels
申请公布号 KR20140034378(A) 申请公布日期 2014.03.20
申请号 KR20120099998 申请日期 2012.09.10
申请人 INDUSTRY-ACADEMIA COOPERATION GROUP OF SEJONG UNIVERSITY 发明人 KIM, BYUNG WHAN;LEE, JU KONG;KIM, DAE HYUN
分类号 H05H1/24;G01N21/00;H01L21/3065 主分类号 H05H1/24
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