| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing exposure method in which a desired drawing pattern can be exposed even when there is positional deviation in a drawing exposure apparatus including two or more light beam irradiation heads.SOLUTION: Provided is a drawing method in which when drawing to an initial basal plate, an irradiation head reference position confirming mark is drawn, and developed, then a reference position confirming mark of the basal plate is performed by length measurement, positional deviation of a light beam irradiation head is detected, then drawing data are amended and drawing exposure is performed based on a positional deviation detection result of a light beam exposure head before drawing to a next basal plate. |
