发明名称 |
SEMICONDUCTOR BUFFER STRUCTURE AND SEMICONDUCTOR ELEMENT INCLUDING THE SAME, AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor buffer structure which reduces a dislocation density in a nitride thin film when the nitride thin film grows on a silicon substrate.SOLUTION: A semiconductor buffer structure according to the present embodiment comprises: a plurality of nitride semiconductor layers in which average relative proportions of gallium increases with distance in one direction; and a dislocation control layer formed from AlInGaN (0≤a1≤1, 0≤b1≤1, a1+b1≠1) arranged between adjacent nitride semiconductor layers among the plurality of nitride semiconductor layers. Because of interposition of the dislocation control layer, a location density of the whole of the plurality of nitride semiconductor layers can be decreased. |
申请公布号 |
JP2014053611(A) |
申请公布日期 |
2014.03.20 |
申请号 |
JP20130183198 |
申请日期 |
2013.09.04 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
KIM JUN-YOUN;KIM JOO-SUNG;LIANG MOON CHENG |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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