发明名称 SEMICONDUCTOR BUFFER STRUCTURE AND SEMICONDUCTOR ELEMENT INCLUDING THE SAME, AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor buffer structure which reduces a dislocation density in a nitride thin film when the nitride thin film grows on a silicon substrate.SOLUTION: A semiconductor buffer structure according to the present embodiment comprises: a plurality of nitride semiconductor layers in which average relative proportions of gallium increases with distance in one direction; and a dislocation control layer formed from AlInGaN (0≤a1≤1, 0≤b1≤1, a1+b1≠1) arranged between adjacent nitride semiconductor layers among the plurality of nitride semiconductor layers. Because of interposition of the dislocation control layer, a location density of the whole of the plurality of nitride semiconductor layers can be decreased.
申请公布号 JP2014053611(A) 申请公布日期 2014.03.20
申请号 JP20130183198 申请日期 2013.09.04
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIM JUN-YOUN;KIM JOO-SUNG;LIANG MOON CHENG
分类号 H01L21/205 主分类号 H01L21/205
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