发明名称 |
ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME |
摘要 |
Acid generator compounds are provided that are particularly useful as a photoresist composition component. Acid generator compounds of the invention comprise 1) a cyclic sulfonium salt and 2) a covalently linked photoacid-labile group. In one aspect, thioxanthone acid generator compounds are particularly preferred, including acid generator compounds that comprise (i) a thioxanthone moiety; and (ii) one or more covalently linked acid labile-groups. |
申请公布号 |
US2014080059(A1) |
申请公布日期 |
2014.03.20 |
申请号 |
US201314027349 |
申请日期 |
2013.09.16 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
LABEAUME PAUL J.;RACHFORD AARON A.;JAIN VIPUL |
分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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