SILICON FILM FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for inexpensively and easily forming high-quality silicon film while taking advantage of silicon film formation by a coating method.SOLUTION: A silicon film forming method in which at least the two steps below are conducted in an arbitrary order, includes: a coating film forming step of forming a coating film by coating a coating film forming composition containing a silane compound onto a substrate, and then applying at least one treatment selected from a group consisting of heating treatment and optical treatment to the coating film; and an atmospheric pressure CVD step of bringing gas generated by heating the silane compound into contact with the heated substrate, under atmospheric pressure.