CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

摘要

A chemically amplified resist composition comprising a base polymer and an amine quencher in the form of aβ-alanine,γ-aminobutyric acid, 5-aminovaleric acid, 6-aminocaproic acid, 7-aminoheptanoic acid. 8-aminooctanoic acid or 9-aminononanoic acid derivative having an unsubstituted carboxyl group has a high contrast of alkaline dissolution in rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide DOF.