| 摘要 |
<p>The present invention relates to a method for regenerating spent ceria-containing polishing agent, the method allowing regeneration as a regenerated ceria-containing polishing agent, having suitable granular distribution and crystal size and exhibiting an accordant desirable polishing rate, while effectively discarding impurities contained in the spent ceria-containing polishing agent. A method for regenerating the spent ceria-containing polishing agent comprises the steps of: dissolving spent ceria (CeO2)-containing sludge in a solvent comprising strong alkali and hydrofluoric acid; cleaning the spent ceria-containing sludge and discarding impurities containing silica (SiO2); drying the cleaned spent ceria-containing sludge by means of a compact disc (CD) dryer; and, in the presence of a flux comprising ammonium salt, alkali metallic salt, metal oxide, metal oxygen acid or alkaline earth metal, sintering the spent sludge at a temperature of 800℃ or higher.</p> |
