发明名称 X-RAY CRYSTAL ANALYSIS METHOD
摘要 PROBLEM TO BE SOLVED: To provide an X-ray crystal analysis method for measuring a crystal distribution in a depth direction from a surface of a sample which has crystals and orderly structure with high accuracy.SOLUTION: A method comprises the steps of: obtaining a profile of change in X-ray diffraction intensity including fine structure such as peak structure and vibration structure which are obtained by changing an incident angle of an X-ray with respect to the sample; calculating X-ray electric field strength in the sample using densities and refraction indexes determined by X-ray reflection intensity and presuming a crystal quantity distribution in a depth direction of the sample; multiplying the electric field strength by the presumed crystal quantity distribution used as weighting factors; calculating an integral of the multiplied result in the thicknesses of organic substances in the sample with respect to the depth direction; obtaining an intensity profile of calculated X-ray diffraction with respect to the incident angles; changing the crystal quantity distribution in the sample in the depth direction to fit the calculated X-ray diffraction intensity profile to a measured X-ray diffraction intensity profile; and determining the changed data as a final crystal quantity distribution in the depth direction.
申请公布号 JP2014052223(A) 申请公布日期 2014.03.20
申请号 JP20120195465 申请日期 2012.09.05
申请人 FUJITSU LTD 发明人 DOI SHUICHI
分类号 G01N23/201 主分类号 G01N23/201
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