COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

摘要

According to one embodiment of the present invention, provided is a method including: (a) applying a curable composition on a substrate; (b) applying a hard mask composition on the curable composition; and (c) applying a photoresist composition on the hard mask composition, wherein at least one of the compositions is removed through an ash-free process. According to another embodiment of the present invention, provided is a method including: (a) applying an organic composition on a substrate; and (b) applying a photoresist composition on the organic composition, wherein the organic composition includes a material forming an alkali-soluble group during a heat and/or radiation treatment. Related compositions are also provided.