| 摘要 |
PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma processing apparatus in which a plasma processing space can be made to be a clean space and which reliably exhausts gas.SOLUTION: There are disposed a reaction gas introduction port 24a for supplying reaction gas, a curtain gas introduction port 28a for supplying curtain gas, a first exhaust port 26a provided between the reaction gas introduction port 24a and the curtain gas introduction port 28a, and a second exhaust port 30a provided in the outside of the curtain gas. The reaction gas supply flow rate>the first exhaust flow rate, the reaction gas supply pressure at the first exhaust port>the curtain gas supply pressure, the total exhaust flow rate>(the reaction gas supply flow rate + the curtain gas flow rate) are made to be satisfied. |
