发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, AND METHOD FOR MANUFACTURING CIRCUIT BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high transparency and excellent heat resistance and light resistance, and to provide a photosensitive film and a method for manufacturing a circuit board using the composition.SOLUTION: The photosensitive resin composition comprises (A) an acrylic resin, (B) a polymerizable compound, (C) a photopolymerization initiator and (D) a hindered phenol-based antioxidant, in which the content percentage of an aromatic ring-containing compound and a structural unit derived from an aromatic ring-containing compound is 0.01 to 5 mass% with respect to the total amount of the (A) to (D) components.
申请公布号 JP2014052493(A) 申请公布日期 2014.03.20
申请号 JP20120196311 申请日期 2012.09.06
申请人 HITACHI CHEMICAL CO LTD 发明人 TAKASAKI TOSHIHIKO;KAMIYA RYOSUKE
分类号 G03F7/004;C08F20/06;G03F7/029;G03F7/033;H05K3/28 主分类号 G03F7/004
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