发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, AND METHOD FOR MANUFACTURING CIRCUIT BOARD |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high transparency and excellent heat resistance and light resistance, and to provide a photosensitive film and a method for manufacturing a circuit board using the composition.SOLUTION: The photosensitive resin composition comprises (A) an acrylic resin, (B) a polymerizable compound, (C) a photopolymerization initiator and (D) a hindered phenol-based antioxidant, in which the content percentage of an aromatic ring-containing compound and a structural unit derived from an aromatic ring-containing compound is 0.01 to 5 mass% with respect to the total amount of the (A) to (D) components. |
申请公布号 |
JP2014052493(A) |
申请公布日期 |
2014.03.20 |
申请号 |
JP20120196311 |
申请日期 |
2012.09.06 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
TAKASAKI TOSHIHIKO;KAMIYA RYOSUKE |
分类号 |
G03F7/004;C08F20/06;G03F7/029;G03F7/033;H05K3/28 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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