发明名称 MICROWAVE ANNEALING APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
摘要 According to one embodiment, a microwave annealing device is provided. The microwave annealing device comprises a housing (10) shielding electromagnetic waves; a first electromagnetic wave source (21) configured to supply a first electromagnetic wave into the housing (10); a second electromagnetic wave source (22) configured to apply, into the housing (10), a second electromagnetic wave having a higher frequency than the first electromagnetic wave; a susceptor (12) configured to hold a semiconductor substrate (11), made of a material transparent to the first electromagnetic wave, and formed in the housing (10); a temperature measuring device (13) configured to measure the temperature of the semiconductor substrate (11); and a control unit (31) configured to control each power of the first and second electromagnetic wave sources (21, 22) in accordance with the temperature measured by the temperature measuring device (13). [Reference numerals] (31) Control part; (32) Processing part
申请公布号 KR20140034675(A) 申请公布日期 2014.03.20
申请号 KR20130036679 申请日期 2013.04.04
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OHNO HIROSHI;AOYAMA TOMONORI;MIYANO KIYOTAKA;HONGUH YOSHINORI;SHIRATSUCHI MASATAKA
分类号 H01L21/324;H01L21/268 主分类号 H01L21/324
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