| 摘要 |
FIELD: chemistry.SUBSTANCE: infrared reflector consists of a metal substrate, characterised by that it is coated with a layer of zirconium nitride and chromium nitride of general formula (ZrCr)Nwith x ranging from 0.15-0.7 and y ranging from 0.01 to 0.265. The method of production involves producing a metal substrate; depositing a layer of zirconium nitride and chromium nitride on said substrate by physical vapour deposition using a target which contains 15-70 wt % zirconium, with the remaining part consisting of chromium and impurities which are inevitable in the treatment process, and injecting nitrogen with a neutral carrier gas in ratio of 4/16 to 16/16 while simultaneously sputtering zirconium and chromium.EFFECT: designing an infrared reflector, having high heat reflecting power and high resistance to high temperatures in corrosive or oxidative media.17 cl |
