APPARATUS AND METHOD OF PROCESSING SUBSTRATE

摘要

The present invention relates to an apparatus and a method for processing a substrate, which facilitate maintenance and repair work of a substrate heater and increase the usage efficiency of process gas.The apparatus for processing the substrate to deposit a thin film on the top surface of the substrate by spraying process gas onto the substrate in a process space provided in a process chamber according to the present invention includes: a substrate support part to support and move at least one substrate; a substrate temperature adjusting part installed in the process chamber to release a substrate temperature adjusting source to the process space and to adjust the temperature of the substrate which is moved by the substrate support part; and a gas spraying part installed in the process chamber and spatially separated from the substrate temperature adjusting part to spray process gas onto the substrate which is moved by the substrate support part.