发明名称 |
Chamber for physical vapor deposition |
摘要 |
A chamber (200; 300; 400; 500; 600; 700; 900; 1000,) for physical vapor deposition is provided. The chamber is adapted for receiving at least one target (230) and a substrate. The chamber includes a housing; a door; and at least one bearing for mounting the target, wherein the bearing is attached to the door. |
申请公布号 |
EP2709138(A1) |
申请公布日期 |
2014.03.19 |
申请号 |
EP20130196091 |
申请日期 |
2010.05.11 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
HINTERSCHUSTER, REINER;LIPPERT, LOTHAR |
分类号 |
H01J37/34;C23C14/34;C23C14/35;H01L21/00 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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