| 摘要 |
PURPOSE: A multi-tube type high flow remote microwave plasma cleaning is provided to produce massively an F-radical which washes a processing chamber including a chemical vapor deposition (CVD) chamber etc. CONSTITUTION: A multi-tube type high flow remote microwave plasma cleaning comprises a waveguide resonator (110), a discharge tube (120), and a tuner (134). The waveguide resonator is formed as a ring form in which a through-hole is prepared in a center. Multiple discharge tube insertion holes are arranged along a circumference with being separated with a constant interval. The discharge tube is arranged in a state of being penetration-inserted into each discharge tube insertion hole of the waveguide resonator. A double pipe is arranged to an extended longitude direction in an inside. The double pipe ejects an F-radical generation gas supplied to one side of the double pipe to the other side by disassembling to an F-radical by generated plasma. The tuner is provided with a microwave generated from an oscillator, and applies to the waveguide resonator. [Reference numerals] (AA) Processing chamber; (BB) F radical |
