| 摘要 |
PROBLEM TO BE SOLVED: To provide a development apparatus which can remove the liquid developer on a substrate even if the operation is stopped due to action of a fail-safe mechanism, or the like, and to provide an application development processing system provided with the development apparatus. SOLUTION: The development apparatus comprises a conveyance mechanism for conveying a substrate, a liquid developer supply section which supplies liquid developer to the substrate conveyed by the conveyance mechanism, a development region provided on the downstream side of the liquid developer supply section in the conveyance direction of the substrate conveyed by the conveyance mechanism and in which the substrate covered with the liquid developer thus supplied is conveyed by the conveyance mechanism, and a cleaning liquid supply section which supplies cleaning liquid, in the development region, to the substrate located in the development region when the conveyance mechanism stops. COPYRIGHT: (C)2012,JPO&INPIT |
