发明名称 |
Level sensor, lithographic apparatus, and substrate surface positioning method |
摘要 |
A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit. |
申请公布号 |
US8675210(B2) |
申请公布日期 |
2014.03.18 |
申请号 |
US201213603168 |
申请日期 |
2012.09.04 |
申请人 |
DEN BOEF ARIE JEFFREY;BENSCHOP JOZEF PETRUS HENRICUS;BRINKHOF RALPH;VENEMA WILLEM JURRIANUS;MACHT LUKASZ JERZY;KHUAT DUY LAURENT;SARRI DIMITRA;ASML NETHERLANDS B.V. |
发明人 |
DEN BOEF ARIE JEFFREY;BENSCHOP JOZEF PETRUS HENRICUS;BRINKHOF RALPH;VENEMA WILLEM JURRIANUS;MACHT LUKASZ JERZY;KHUAT DUY LAURENT;SARRI DIMITRA |
分类号 |
G01B11/14 |
主分类号 |
G01B11/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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