发明名称 |
Lithographic apparatus and method of removing liquid |
摘要 |
A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35� and 90� to the local tangent of the gap. |
申请公布号 |
US8675172(B2) |
申请公布日期 |
2014.03.18 |
申请号 |
US20100709278 |
申请日期 |
2010.02.19 |
申请人 |
JACOBS HERNES;LOOPSTRA ERIK ROELOF;RIEPEN MICHEL;MONDT EVA;ASML NETHERLANDS B.V. |
发明人 |
JACOBS HERNES;LOOPSTRA ERIK ROELOF;RIEPEN MICHEL;MONDT EVA |
分类号 |
G03B27/42;G03B27/52;G03B27/58 |
主分类号 |
G03B27/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|