发明名称 |
Film deposition apparatus and substrate processing apparatus |
摘要 |
A film deposition apparatus includes: a turntable; a first reaction gas supply part and a second reaction gas supply part extending from a circumferential edge toward a rotation center of the turntable; and a first separation gas supply part provided between the first and second reaction gas supply parts. A first space contains the first reaction gas supply part and has a first height. A second space contains the second reaction gas supply part and has a second height. A third space contains a first separation gas supply part and has a height lower than the first and second heights. A motor provided under the rotation center of the turntable rotates the turntable. A rotation shaft of the turntable and a drive shaft of the motor are coupled without generation of slip. |
申请公布号 |
US8673079(B2) |
申请公布日期 |
2014.03.18 |
申请号 |
US20090550453 |
申请日期 |
2009.08.31 |
申请人 |
KATO HITOSHI;HONMA MANABU;HANEISHI TOMOKI;TOKYO ELECTRON LIMITED |
发明人 |
KATO HITOSHI;HONMA MANABU;HANEISHI TOMOKI |
分类号 |
C23C16/455;C23C16/00 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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