发明名称 finFET eDRAM strap connection structure
摘要 A method of forming a strap connection structure for connecting an embedded dynamic random access memory (eDRAM) to a transistor comprises forming a buried oxide layer in a substrate, the buried oxide layer defining an SOI layer on a surface of the substrate; forming a deep trench through the SOI layer and the buried oxide layer in the substrate; forming a storage capacitor in a lower portion of the deep trench; conformally doping a sidewall of an upper portion of the deep trench; depositing a metal strap on the conformally doped sidewall and on the storage capacitor; forming at least one fin in the SOI layer, the fin being in communication with the metal strap; forming a spacer over the metal strap and over a juncture of the fin and the metal strap; and depositing a passive word line on the spacer.
申请公布号 US8673729(B1) 申请公布日期 2014.03.18
申请号 US201213705477 申请日期 2012.12.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BASKER VEERARAGHAVAN S.;LEOBANDUNG EFFENDI;YAMASHITA TENKO;YEH CHUN-CHEN
分类号 H01L29/76 主分类号 H01L29/76
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