发明名称 Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method
摘要 A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows, and an outlet downstream of the contractor to provide the gas flow to the two parallel plates.
申请公布号 US8675170(B2) 申请公布日期 2014.03.18
申请号 US201213406006 申请日期 2012.02.27
申请人 VAN BOXTEL FRANK JOHANNES JACOBUS;DEBRAUWER PIETER;VAN DER STEEN ANTONIUS ARNOLDUS HENRICUS;KOLDEWEIJ ROBIN BERNARDUS JOHANNES;ASML NETHERLANDS B.V. 发明人 VAN BOXTEL FRANK JOHANNES JACOBUS;DEBRAUWER PIETER;VAN DER STEEN ANTONIUS ARNOLDUS HENRICUS;KOLDEWEIJ ROBIN BERNARDUS JOHANNES
分类号 G03B27/52;G03B27/42 主分类号 G03B27/52
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