发明名称 |
Method for manufacturing photomask and photomask manufactured using the same |
摘要 |
A method for manufacturing a photomask includes forming a photoresist film on a substrate, and forming a defect detecting pattern on the photoresist film. The defect detecting pattern has a first pattern elongated in a first direction and a second pattern overlapping one end of the first pattern and elongated in a second direction different from the first direction. The first pattern and the second pattern are formed using electron beams (e-beam) diffracted by a same amplifier. |
申请公布号 |
US8673522(B2) |
申请公布日期 |
2014.03.18 |
申请号 |
US201213571043 |
申请日期 |
2012.08.09 |
申请人 |
CHOI JIN;KIM BYUNG-GOOK;KIM HEE-BOM;LEE SANG-HEE;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI JIN;KIM BYUNG-GOOK;KIM HEE-BOM;LEE SANG-HEE |
分类号 |
G03F1/38 |
主分类号 |
G03F1/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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