发明名称 Interconnect structure with cavity having one or several contact rises on the wall of the cavity and method for producing same
摘要 An interconnect device is disclosed including a support in which at least one hole is formed, the hole having walls forming a closed contour and being formed by a cavity and one or several slots communicating with the cavity. The slots extend in a direction making a non-zero angle with the main plane of the support. Several conducting elements are positioned on at least one wall of the hole and pass through the hole. The conducting elements are each intended to connect conducting areas to each other that are situated on either side of the support. At least one of the slots separates two of the conducting elements from each other.
申请公布号 US8674489(B2) 申请公布日期 2014.03.18
申请号 US20100912203 申请日期 2010.10.26
申请人 BOLIS SEBASTIEN;JACQUET FABRICE;SAINT-PATRICE DAMIEN;COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 BOLIS SEBASTIEN;JACQUET FABRICE;SAINT-PATRICE DAMIEN
分类号 H01L23/02 主分类号 H01L23/02
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