发明名称 |
Intensity selective exposure photomask |
摘要 |
An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage. Each of the features of the first and second array includes an opening disposed in an area of attenuating material. |
申请公布号 |
US8673520(B2) |
申请公布日期 |
2014.03.18 |
申请号 |
US201113046265 |
申请日期 |
2011.03.11 |
申请人 |
LIU GEORGE;CHEN KUEI SHUN;YEH CHIH-YANG;HUANG TE-CHIH;LIU WEN-HAO;CHENG YING-CHOU;LUO BOREN;OU TSONG-HUA;TANG YU-PO;HUANG WEN-CHUN;LIU RU-GUN;LU SHU-CHEN;LIU YU LUN;KU YAO-CHING;GAU TSAI-SHENG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIU GEORGE;CHEN KUEI SHUN;YEH CHIH-YANG;HUANG TE-CHIH;LIU WEN-HAO;CHENG YING-CHOU;LUO BOREN;OU TSONG-HUA;TANG YU-PO;HUANG WEN-CHUN;LIU RU-GUN;LU SHU-CHEN;LIU YU LUN;KU YAO-CHING;GAU TSAI-SHENG |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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