发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam. |
申请公布号 |
US8675175(B2) |
申请公布日期 |
2014.03.18 |
申请号 |
US201313791477 |
申请日期 |
2013.03.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GEORGE RICHARD ALEXANDER;GUI CHENG-QUN;DE JAGER PIETER WILLEM HERMAN;VAN LEEUWEN ROBBERT EDGAR;BURGHOORN JACOBUS |
分类号 |
G01B11/00;G03B27/32;G03B27/42;G03B27/54;G03B27/74;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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