发明名称 Photosensitive resin composition containing copolymer
摘要 There is provided a photosensitive resin composition having desired properties. A photosensitive resin composition comprising: a component (A) that is a copolymer including a structural unit of Formula (1) and at least one structural unit of Formula (2), and a component (B) that is a photosensitizer: (where two Xs are independently a hydrogen atom, a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group, or a benzyl group and Y is a hydrogen atom, a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group, or a benzyl group provided that each of a part or all of the hydrogen atoms in the alkyl group, the cycloalkyl group, the phenyl group, and the benzyl group is optionally substituted with a halogen atom, a carboxy group, a hydroxy group, an amino group, or a nitro group).
申请公布号 US8674043(B2) 申请公布日期 2014.03.18
申请号 US201013395336 申请日期 2010.08.30
申请人 KISHIOKA TAKAHIRO;NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 KISHIOKA TAKAHIRO
分类号 C08F12/26;C08F12/32;C08F20/52;C08F22/40;C08F220/52;C08F222/40 主分类号 C08F12/26
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