发明名称 Method for forming fine pattern of polymer thin film
摘要 Provided is a method of forming a fine pattern of a polymer thin film using a phenomenon that another material having a large difference in surface energy in comparison with a polymer thin film pattern is dewetted on the polymer thin film pattern. Two polymer materials having a large difference in surface energy can be applied to readily and conveniently form a fine pattern of a polymer thin film of micrometer or sub-micrometer grade.
申请公布号 US8673403(B2) 申请公布日期 2014.03.18
申请号 US20090542188 申请日期 2009.08.17
申请人 KIM SEONG HYUN;LIM SANG CHUL;YANG YONG SUK;KIM ZIN SIG;YOUN DOO HYEB;ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM SEONG HYUN;LIM SANG CHUL;YANG YONG SUK;KIM ZIN SIG;YOUN DOO HYEB
分类号 B05D1/04;B05D1/36;B05D1/40 主分类号 B05D1/04
代理机构 代理人
主权项
地址