发明名称 Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method
摘要 A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
申请公布号 US8675169(B2) 申请公布日期 2014.03.18
申请号 US201113273817 申请日期 2011.10.14
申请人 VAN BOXTEL FRANK JOHANNES JACOBUS;VAN DAM MARINUS JOHANNES MARIA;JASPER JOHANNES CHRISTIAAN MARIA;VAN DER HAM RONALD;SHULEPOV SERGEI YURIEVICH;PIETERSE GERBEN;BARAGONA MARCO;DEBRAUWER PIETER;VAN DER STEEN ANTONIUS ARNOLDUS HENRICUS;ASML NETHERLANDS B.V. 发明人 VAN BOXTEL FRANK JOHANNES JACOBUS;VAN DAM MARINUS JOHANNES MARIA;JASPER JOHANNES CHRISTIAAN MARIA;VAN DER HAM RONALD;SHULEPOV SERGEI YURIEVICH;PIETERSE GERBEN;BARAGONA MARCO;DEBRAUWER PIETER;VAN DER STEEN ANTONIUS ARNOLDUS HENRICUS
分类号 G03B27/52;G03B27/42 主分类号 G03B27/52
代理机构 代理人
主权项
地址