发明名称 Method of forming continuous thin film and linear glass substrate with thin film
摘要 A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.
申请公布号 US8673396(B2) 申请公布日期 2014.03.18
申请号 US20080232183 申请日期 2008.09.11
申请人 NAKAMURA TOSHIHIRO;TODA SADAYUKI;KOAIZAWA HISASHI;FURUKAWA ELECTRIC CO., LTD. 发明人 NAKAMURA TOSHIHIRO;TODA SADAYUKI;KOAIZAWA HISASHI
分类号 C23C16/24;C23C16/458;C23C16/46;C23C16/54;H01L21/02 主分类号 C23C16/24
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