| 摘要 |
PROBLEM TO BE SOLVED: To improve, when a pattern is drawn on a substrate by scanning the substrate with plural light beams from plural light beam irradiation devices, the drawing quality by correcting variation in intensity distribution of diffraction light of the light beams due to variation in operation angle of a mirror of a spatial optical modulator. SOLUTION: A pattern is drawn on a substrate by scanning the substrate with a plurality of light beams from a plurality of light beam irradiation devices 20 including an illumination optical system 20c for supplying a light beam, a spatial optical modulator 25 for modulating the light beam by changing the angles of mirrors disposed in two directions, a driving circuit 27 for driving the spatial optical modulator based on drawn data, and an irradiation optical system 20b for emitting the light beam modulated by the spatial optical modulator 25 in a manner that a chuck is moved relative to the plural light beam irradiation devices 20. The incidence angle of the light beam supplied to the spatial optical modulator of each light beam irradiation device is adjusted in accordance with the variation in operation angle of the mirror of the spatial optical modulator of each light beam irradiation device. COPYRIGHT: (C)2012,JPO&INPIT |
