发明名称 |
Microplasma ion source for focused ion beam applications |
摘要 |
The present invention provides a method of obtaining a bright source of ions with narrow energy spread for focused ion beam applications using micro plasmas. As a preferred embodiment, a high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xe+ and/or Xe2+ ions having ion temperature of the order of 0.5-1 eV and a current density on the order of 0.1-1 A/cm2 or higher. |
申请公布号 |
US8674321(B2) |
申请公布日期 |
2014.03.18 |
申请号 |
US201213478012 |
申请日期 |
2012.05.22 |
申请人 |
MAKAROV VLADIMIR V.;MACHERET SERGEY;TIZA LAB, L.L.C. |
发明人 |
MAKAROV VLADIMIR V.;MACHERET SERGEY |
分类号 |
H01J37/08;A61L2/14;H01J27/26;H01J37/317;H01J37/32;H01J49/16;H01J49/40 |
主分类号 |
H01J37/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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