| 摘要 |
PURPOSE: A bubbling device for high temperature chemical vapor deposition is provided to manufacture target substances by applying various kinds of substances and to facilitate the vaporization of liquid-phase materials at a relatively low temperature. CONSTITUTION: A bubbling device for high temperature chemical vapor deposition comprises a material storage part (102), a bubble gas supply part, a first heating unit, a bubble gas inlet (116), and a material gas outlet (118). The material storage part stores liquid-phase materials. The bubble gas supply part supplies bubble gas to bubble the materials. The first heating unit heats the materials bubbled by the bubble gas to vaporize. The bubble gas inlet is a passage to introduce the bubble gas into the material storage part. The material gas outlet is a passage to supply materials gas formed by vaporizing the materials from the material storage part to a reaction chamber of a high-temperature chemical vapor deposition device. |
