发明名称 NOVEL POLYSILOXANE COMPOUND AND THIN FILM USING THE SAME, AND METHOD FOR PRODUCING MICROFINE STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a material that can be heated at above a specific temperature to cause phase separation and thereby can form microfine patterns of about 10 nm or less.SOLUTION: A polysiloxane compound is represented in the formula (1). In the formula (1), R, each independently, is aryl in which one or more hydrogen may be substituted to other substituent, or arylalkyl in which one or more hydrogen may be substituted to other substituent, Ris alkyl or aryl of carbon number 1 to 10, and Y is substituent.
申请公布号 JP2014047335(A) 申请公布日期 2014.03.17
申请号 JP20120193901 申请日期 2012.09.04
申请人 TOKYO INSTITUTE OF TECHNOLOGY;JNC CORP 发明人 HAYAKAWA TERUAKI;OU RAI;MAEDA RINA;YOSHIDA KAZUHIRO
分类号 C08G77/38;B82B3/00;B82Y30/00;B82Y40/00;H01L21/027 主分类号 C08G77/38
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