发明名称 |
EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIAL, AND FINE PATTERN FORMING METHOD USING THE COMPOSITION |
摘要 |
The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si-H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction. |
申请公布号 |
KR101375445(B1) |
申请公布日期 |
2014.03.17 |
申请号 |
KR20107010111 |
申请日期 |
2008.11.05 |
申请人 |
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发明人 |
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分类号 |
C07D303/02;C07D303/16;C08L83/04 |
主分类号 |
C07D303/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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