| 摘要 |
The present invention relates to a stripper composition for photoresist removal. The composite according to the present invention comprises 1-5 wt% of a compound represented by chemical formula (1), 70-95 wt% of a polar organic solvent, 0.1-5 wt% of a hydroxide-based compound and a rest amount of water. The stripper composition according to the present invention is able to effectively complete a stripping process within a short time by including the proper amount of the compound represented by chemical formula (1) without an anticorrosive agent and is able to minimize composition variation in a stripping process performed at relatively high process temperatures as compared to a different process. The stripper composition is able to prevent post-processing defect such as evaporation defect due to the adsorption of non-aqueous anticorrosive agents by excluding anticorrosive agents while preventing electrode damage. |
