| 发明名称 |
PHOTORESIST COMPOSITION AND PATTERNING METHOD USING THE SAME |
| 摘要 |
<p>The present invention relates to a photoresist composition and patterning method using the same. The photoresist composition of the present invention minimizes the loss from side etching to form a micro pattern having a great linearity and a uniform shape. The photoresist pattern is able to improve the adhesion properties to a bottom substrate, the sensitivity, the heat-resisting properties, etc. [Reference numerals] (AA) Example 1; (BB) Example 2; (CC) Comparative example 1</p> |
| 申请公布号 |
KR20140032695(A) |
申请公布日期 |
2014.03.17 |
| 申请号 |
KR20120099315 |
申请日期 |
2012.09.07 |
| 申请人 |
LG CHEM. LTD. |
发明人 |
SHIN, BO RA;JEONG, HYE WON;HAN, HEE;KIM, KYUNG JUN;PARK, CHAN HYO |
| 分类号 |
G03F7/004;G03F7/26;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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