| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a pattern with reduced development unevenness can be formed.SOLUTION: The photosensitive resin composition comprises: (A) a binder resin; (B) a polymerizable compound expressed by formula (I); and (C) a photopolymerization initiator. In formula (I), R, Rand Rrepresent a hydrogen atom or a methyl group; and X represents -R-O-R-, where Rrepresents a single bond or an alkylene group having 1 to 5 carbon atoms and Rrepresents an alkylene group having 1 to 3 carbon atoms and having a hydroxyl group. |
